TY  - GEN
DO  - 10.6083/M4XS5S9K
DO  - DOI
AD  - Oregon Graduate Institute of Science and Technology
T1  - Process development for si-based nanostructures using pulsed UV laser induced epitaxy
DA  - 1995
AU  - Deng, Chaodan
L1  - https://digitalcollections.ohsu.edu/record/101/files/101_etd.pdf
PB  - Oregon Graduate Institute of Science and Technology
PY  - 1995
ID  - 101
L4  - https://digitalcollections.ohsu.edu/record/101/files/101_etd.pdf
KW  - very large scale integration
KW  - integrated circuits
KW  - epitaxy
KW  - ultra large scale integration
KW  - pulsed laser deposition
TI  - Process development for si-based nanostructures using pulsed UV laser induced epitaxy
Y1  - 1995
L2  - https://digitalcollections.ohsu.edu/record/101/files/101_etd.pdf
LK  - https://digitalcollections.ohsu.edu/record/101/files/101_etd.pdf
UR  - https://digitalcollections.ohsu.edu/record/101/files/101_etd.pdf
ER  -