000000101 001__ 101
000000101 005__ 20231130114537.0
000000101 0247_ $$2DOI$$a10.6083/M4XS5S9K
000000101 037__ $$aETD
000000101 245__ $$aProcess development for si-based nanostructures using pulsed UV laser induced epitaxy
000000101 260__ $$bOregon Graduate Institute of Science and Technology
000000101 269__ $$a1995
000000101 336__ $$aDissertation
000000101 502__ $$bPh.D.
000000101 540__ $$fCC BY
000000101 542__ $$fIn copyright - single owner
000000101 6531_ $$avery large scale integration
000000101 6531_ $$aintegrated circuits
000000101 6531_ $$aepitaxy
000000101 6531_ $$aultra large scale integration
000000101 6531_ $$apulsed laser deposition
000000101 692__ $$aDepartment of Electrical and Computer Engineering$$041409
000000101 7001_ $$aDeng, Chaodan
000000101 7001_ $$uOregon Graduate Institute of Science and Technology$$041352
000000101 8564_ $$928b8401a-d156-400e-9615-476f41d8ad91$$s5583558$$uhttps://digitalcollections.ohsu.edu/record/101/files/101_etd.pdf
000000101 905__ $$a/rest/prod/bn/99/96/73/bn9996734
000000101 909CO $$ooai:digitalcollections.ohsu.edu:101$$pstudent-work
000000101 980__ $$aTheses and Dissertations