TY  - THES
DO  - 10.6083/M4F769GJ
DO  - DOI
AD  - Oregon Graduate Institute of Science and Technology
T1  - The microstructural effects of metallization and heat treatment on thin gate oxide for use in sub-micron MOSFETs
DA  - 1996
AU  - McCarthy, John M.
L1  - https://digitalcollections.ohsu.edu/record/12/files/12_etd.pdf
PB  - Oregon Graduate Institute of Science and Technology
PY  - 1996
ID  - 12
L4  - https://digitalcollections.ohsu.edu/record/12/files/12_etd.pdf
KW  - metallic films
KW  - metal oxide semiconductor field-effect transistors
KW  - sputtering (physics)
TI  - The microstructural effects of metallization and heat treatment on thin gate oxide for use in sub-micron MOSFETs
Y1  - 1996
L2  - https://digitalcollections.ohsu.edu/record/12/files/12_etd.pdf
LK  - https://digitalcollections.ohsu.edu/record/12/files/12_etd.pdf
UR  - https://digitalcollections.ohsu.edu/record/12/files/12_etd.pdf
ER  -