TY  - GEN
AD  - Oregon Graduate Institute of Science and Technology
AU  - Lantz, Scott L.
DA  - 1995-01-01
DO  - 10.6083/M43R0R47
DO  - DOI
ID  - 2053
L1  - https://digitalcollections.ohsu.edu/record/2053/files/2770_etd.pdf
L2  - https://digitalcollections.ohsu.edu/record/2053/files/2770_etd.pdf
L4  - https://digitalcollections.ohsu.edu/record/2053/files/2770_etd.pdf
LK  - https://digitalcollections.ohsu.edu/record/2053/files/2770_etd.pdf
PB  - Oregon Health and Sciences University
PB  - Oregon Graduate Institute of Science and Technology
PY  - 1995-01-01
T1  - Influence of surface preparation on the chemical vapor deposition of W on Si(100) and polycrystalline TiN surfaces
TI  - Influence of surface preparation on the chemical vapor deposition of W on Si(100) and polycrystalline TiN surfaces
UR  - https://digitalcollections.ohsu.edu/record/2053/files/2770_etd.pdf
Y1  - 1995-01-01
ER  -