TY  - GEN
AD  - Oregon Graduate Center
AU  - Ryoo, Kunkul
DA  - 1986
DO  - 10.6083/M46M34RJ
DO  - DOI
ID  - 215
KW  - Semiconductors
KW  - ion implantation
KW  - defects
L1  - https://digitalcollections.ohsu.edu/record/215/files/215_etd.pdf
L2  - https://digitalcollections.ohsu.edu/record/215/files/215_etd.pdf
L4  - https://digitalcollections.ohsu.edu/record/215/files/215_etd.pdf
LK  - https://digitalcollections.ohsu.edu/record/215/files/215_etd.pdf
PB  - Oregon Graduate Center
PY  - 1986
T1  - A study of effect of precipitates and lattice defects on the electrical performance of P-N junctions
TI  - A study of effect of precipitates and lattice defects on the electrical performance of P-N junctions
UR  - https://digitalcollections.ohsu.edu/record/215/files/215_etd.pdf
Y1  - 1986
ER  -